Anisotropic Inter-Poly Dielectric technology for conventional floating gate type flash memory

Type:
Conference Proceedings
Info:
2014 IEEE 6th International Memory Workshop (IMW)
Date:
2014-05-18

Author Information

Name Institution
F. KikushimaToshiba Corporation

Films

Plasma SiNx

Hardware used: Unknown


Film/Plasma Properties

Substrates

Notes

239