Publication Information

Title: Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle

Type: Journal

Info: J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015

Date: 2014-12-01

DOI: http://dx.doi.org/10.1116/1.4904147

Author Information

Name

Institution

Sungkyunkwan University

Films

Deposition Temperature = 375C

27804-64-4

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

230

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