Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition

Type:
Journal
Info:
APL MATERIALS 2, 096109 (2014)
Date:
2014-08-26

Author Information

Name Institution
Ali HaiderBilkent University
Çağla ÖzgitBilkent University
Fatma KayaciBilkent University
Ali Kemal OkyayBilkent University
Tamer UyarBilkent University
Necmi BiyikliBilkent University

Films



Film/Plasma Properties

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Nylon 6,6
Si(100)

Notes

Meaglow Ltd hollow cathode RF-plasma source was used.
BN film characterized as sequential CVD due to running considerably higher than the known thermal decomposition temperature for the TEB.
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