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Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
Type:
Journal
Info:
Chem. Vap. Deposition 2007, 13, 408–413
Date:
2007-03-06
Author Information
| Name | Institution |
|---|---|
| Antti Niskanen | University of Helsinki |
| Timo T. Hatanpää | University of Helsinki |
| Kai Arstila | University of Helsinki |
| Markku A. Leskelä | University of Helsinki |
| Mikko K. Ritala | University of Helsinki |
Films
Plasma Ag
Plasma Ag
Film/Plasma Properties
Characteristic: Precursor Characterization
Analysis: CHN Elemental Analysis
Characteristic: Precursor Characterization
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Characteristic: Precursor Characterization
Analysis: NMR, Nuclear Magnetic Resonance
Characteristic: Precursor Characterization
Analysis: QMS, Quadrupole Mass Spectrometer
Characteristic: Precursor Characterization
Analysis: SDTA, Simultaneous Difference Thermal Analysis
Characteristic: Precursor Characterization
Analysis: TGA, Thermo Gravimetric Analysis
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Characteristic: Resistivity, Sheet Resistance
Analysis: -
Characteristic: Thickness
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Substrates
| Glass |
| Silicon |
Notes
| Aeronex GateKeeper gas purifiers used |
| 41 |