Publication Information

Title: ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium

Type: Journal

Info: ECS Journal of Solid State Science and Technology, 3 (3) N39-N45 (2014)

Date: 2014-01-06

DOI: http://dx.doi.org/10.1149/2.012403jss

Author Information

Name

Institution

CEA - LETI MINATEC

CEA - LETI MINATEC

CEA - LETI MINATEC

CEA - LETI MINATEC

CEA - LETI MINATEC

Films

Plasma ZrO2 using ASM EmerALD

Deposition Temperature Range = 200-300C

33271-88-4

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

PANalytical Xpert PRO MPD X-ray Diffractometer

Thickness

XRR, X-Ray Reflectivity

Jordan Valley JVX 5200

Density

XRR, X-Ray Reflectivity

Jordan Valley JVX 5200

Refractive Index

Ellipsometry

Horiba Jobin Yvon

Band Gap

Ellipsometry

Horiba Jobin Yvon

Chemical Composition, Impurities

ATR-FTIR

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Bruker Dimension 5

Chemical Composition, Impurities

TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry

ION TOF TofSIMS 5

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Van de Graaff ion accelerator of CENBG

Chemical Composition, Impurities

nRBS, nonRutherford Back Scattering

Van de Graaff ion accelerator of CENBG

Chemical Composition, Impurities

NRA, Nuclear Reaction Analysis

Van de Graaff ion accelerator of CENBG

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Leakage Current

I-V, Current-Voltage Measurements

Keithley 2635 Source Meter

Breakdown Voltage

I-V, Current-Voltage Measurements

Keithley 2635 Source Meter

Substrates

TiN

Keywords

High-k Dielectric Thin Films

PEALD Film Development

Notes

PEALD ZrO2 film development with Air Liquid ZyALD precursor.

237

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