Electrical characterization of the slow boron oxygen defect component in Czochralski silicon

Type:
Journal
Info:
physica status solidi (RRL) - Rapid Research Letters Volume 9, Issue 12, pages 692--696, 2015
Date:
2015-10-21

Author Information

Name Institution
Tim NieweltFraunhofer Institute for Solar Energy Systems (ISE)
Jonas SchönFraunhofer Institute for Solar Energy Systems (ISE)
Juliane BroischFraunhofer Institute for Solar Energy Systems (ISE)
Wilhelm WartaFraunhofer Institute for Solar Energy Systems (ISE)
Martin C. SchubertFraunhofer Institute for Solar Energy Systems (ISE)

Films

Plasma Al2O3


Film/Plasma Properties

Substrates

Silicon

Notes

469