Publication Information

Title: Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches

Type: Journal

Info: The Journal of Chemical Physics 146, 052818 (2017)

Date: 2016-11-29

DOI: http://dx.doi.org/10.1063/1.4972120

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Plasma Pt using Custom ICP

Deposition Temperature = 300C

94442-22-5

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000U

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

JEOL 7500F

Conformality, Step Coverage

TEM, Transmission Electron Microscope

FEI Tecnai F30ST

Substrates

SiO2

Keywords

Notes

897

Disclaimer

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