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Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
Type:
Journal
Info:
Journal of Applied Physics 120, 085315 (2016)
Date:
2016-07-19
Author Information
| Name | Institution |
|---|---|
| Ahmad Chaker | Grenoble Alps University (UGA) |
| P. D. Szkutnik | Grenoble Alps University (UGA) |
| John Pointet | Grenoble Alps University (UGA) |
| Patrice Gonon | Grenoble Alps University (UGA) |
| Christophe Vallée | Grenoble Alps University (UGA) |
| Ahmad Bsiesy | Grenoble Alps University (UGA) |
Films
Plasma TiO2
Thermal TiO2
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Substrates
| RuO2 |
Notes
| 909 |