Publication Information

Title: The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides

Type: Conference Proceedings

Info: ECS Transactions, 33 (2) 61-67 (2010)

Date: 2010-07-08

DOI: http://dx.doi.org/10.1149/1.3485242

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Deposition Temperature Range N/A

75-24-1

7782-44-7

Plasma Al2O3 using Custom ICP

Deposition Temperature Range N/A

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Ion Energy

RFEA, Retarding Field Energy Analyzer

Impedans Semion

Ion Flux

RFEA, Retarding Field Energy Analyzer

Impedans Semion

Ion Flux

Custom

Custom

Electron Temperature, Te

Langmuir Probe

Custom

Electron Density, ne

Langmuir Probe

Custom

Gas Phase Species

OES, Optical Emission Spectroscopy

Ocean Optics USB 2000

Gas Phase Species

OES, Optical Emission Spectroscopy

McPherson 234/302 monochrometer

Minority Carrier Lifetime

Photoconductance

Sinton WCT-100

Substrates

Silicon

Keywords

Passivation

Solar

Notes

718

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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