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Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
Type:
Journal
Info:
Thin Solid Films, Volume 566, 1 September 2014, Pages 93-98
Date:
2014-07-17
Author Information
| Name | Institution |
|---|---|
| Bo-Heng Liu | National Applied Research Laboratories |
Films
Film/Plasma Properties
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope
Characteristic: Resistivity, Sheet Resistance
Analysis: -
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Thickness
Analysis: -
Substrates
| Glass |
| Silicon |
Notes
| PEALD Pt deposition for catalyst application. |
| 280 |