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Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 041506 (2016)
Date:
2016-05-16
Author Information
| Name | Institution |
|---|---|
| Mikael Broas | Aalto University |
| Perttu Sippola | Aalto University |
| Timo Sajavaara | University of Jyväskylä |
| Vesa Vuorinen | Aalto University |
| Alexander Pyymaki Perros | Aalto University |
| Harri Lipsanen | Aalto University |
| Mervi Paulasto-Kröckel | Aalto University |
Films
Plasma AlN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Characteristic: Hydrogen Desorption
Analysis: TDS, Thermal Desorption Spectroscopy
Substrates
| Si(100) |
Notes
| 792 |