The publication database currently has 1700 entries.
Use Advanced Search for more complex searches
Innatiux is a retained executive recruiting firm with a focus on the search and placement of proven leaders for client companies in the field of high-tech capital equipment and analytical instrumentation. We are seeking WW technical and business leaders with a background in semiconductor deposition to fill confidential senior and executive level positions with our clients. Visit us at: www.innatiux.com
Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
Type:
Journal
Info:
ACS Photonics, 2016, 3 (11), pp 2040-2048
Date:
2016-09-09
Author Information
| Name | Institution |
|---|---|
| John Rönn | Aalto University |
| Lasse Karvonen | Aalto University |
| Christoffer Kauppinen | Aalto University |
| Alexander Pyymaki Perros | Aalto University |
| Nasser Peyghambarian | University of Arizona |
| Harri Lipsanen | Aalto University |
| Antti Säynätjoki | Aalto University |
| Zhipei Sun | Aalto University |
Films
Other Er:Al2O3
Hardware used: Picosun R200
Er(TMHD)3, Er(THD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) erbium, Erbium dipivaloylmethanate
CAS#: 35733-23-4
CAS#: 7782-44-7
CAS#: 7732-18-5
Plasma Er2O3
Hardware used: Picosun R200
Er(TMHD)3, Er(THD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) erbium, Erbium dipivaloylmethanate
CAS#: 35733-23-4
CAS#: 7782-44-7
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence
Substrates
| Silicon |
Notes
| 847 |