Publication Information

Title: Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide

Type: Journal

Info: Langmuir, 2010, 26 (17), pp 13732-13735

Date: 2010-06-19

DOI: http://dx.doi.org/10.1021/la101485a

Author Information

Name

Institution

Colorado School of Mines

Eindhoven University of Technology

Colorado School of Mines

Films

Plasma Al2O3 using Custom ICP

Deposition Temperature = 150C

75-24-1

7782-44-7

Thermal Al2O3 using Custom ICP

Deposition Temperature = 150C

75-24-1

10028-15-6

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Surface Reactions

ATR-FTIR

Unknown

Substrates

ZnSe

Al2O3

Keywords

Reaction Mechanism

Notes

717

Disclaimer

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