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Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
Type:
Journal
Info:
Journal of The Electrochemical Society, 157 (7) P66-P74 (2010)
Date:
2010-04-16
Author Information
| Name | Institution |
|---|---|
| Stephen E. Potts | Eindhoven University of Technology |
| Wytze Keuning | Eindhoven University of Technology |
| E. Langereis | Eindhoven University of Technology |
| Gijs Dingemans | Eindhoven University of Technology |
| Mauritius C. M. (Richard) van de Sanden | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Plasma Al2O3
Plasma Al2O3
Thermal Al2O3
Thermal Al2O3
Plasma TiO2
Plasma TiO2
Plasma TiO2
Plasma Ta2O5
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Density
Analysis: Ellipsometry
Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Substrates
| Si(100) |
Notes
| 709 |