The publication database currently has 1700 entries.
Use Advanced Search for more complex searches
Innatiux is a retained executive recruiting firm with a focus on the search and placement of proven leaders for client companies in the field of high-tech capital equipment and analytical instrumentation. We are seeking WW technical and business leaders with a background in semiconductor deposition to fill confidential senior and executive level positions with our clients. Visit us at: www.innatiux.com
Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
Type:
Journal
Info:
J. Vac. Sci. Technol. A 32(1), Jan/Feb 2014, 01A132
Date:
2013-12-09
Author Information
| Name | Institution |
|---|---|
| Khalil El-Hajjam | Lyon Nanotechnology Institute (INL) |
| Nicolas Baboux | Lyon Nanotechnology Institute (INL) |
| Francis Calmon | Lyon Nanotechnology Institute (INL) |
| Abdelkader Souifi | French National Centre for Scientific Research (CNRS) |
| Olivier Poncelet | Universite catholique de Louvain (UCL) |
| Laurent A. Francis | Universite catholique de Louvain (UCL) |
| Serge Ecoffey | French National Centre for Scientific Research (CNRS) |
| Dominique Drouin | French National Centre for Scientific Research (CNRS) |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Fowler-Nordheim (FN) Current Plots
Analysis: I-V, Current-Voltage Measurements
Characteristic: Effective Mass
Analysis: I-V, Current-Voltage Measurements
Characteristic: Barrier Height
Analysis: I-V, Current-Voltage Measurements
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| Pt |
Notes
| Anneal |
| Longer O2 plasma results in lower film capacitance. |
| 12 |