Publication Information

Title: Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering

Type: Journal

Info: J. Vac. Sci. Technol. A 32(1), Jan/Feb 2014, 01A132

Date: 2013-12-09

DOI: http://dx.doi.org/10.1116/1.4853075

Author Information

Name

Institution

Lyon Nanotechnology Institute (INL)

Lyon Nanotechnology Institute (INL)

Lyon Nanotechnology Institute (INL)

French National Centre for Scientific Research (CNRS)

Universite catholique de Louvain (UCL)

Universite catholique de Louvain (UCL)

French National Centre for Scientific Research (CNRS)

French National Centre for Scientific Research (CNRS)

Films

Plasma Al2O3 using Unknown

Deposition Temperature = 250C

75-24-1

7782-44-7

Plasma HfO2 using Unknown

Deposition Temperature = 250C

19962-11-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Horiba Jobin Yvon

Thickness

Ellipsometry

Horiba Jobin Yvon UVISEL

Capacitance

C-V, Capacitance-Voltage Measurements

Keithley 4200-SCS

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

Keithley 4200-SCS

Fowler-Nordheim (FN) Current Plots

I-V, Current-Voltage Measurements

Keithley 4200-SCS

Effective Mass

I-V, Current-Voltage Measurements

Keithley 4200-SCS

Barrier Height

I-V, Current-Voltage Measurements

Keithley 4200-SCS

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Unknown

Substrates

Pt

Keywords

Single Electron Transistor (SET)

Dielectric Stack

PEALD Film Development

Tunnel Junctions

Nanolaminate

Notes

Anneal

Longer O2 plasma results in lower film capacitance.

12

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