Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories

Type:
Journal
Info:
Chem. Mater. 2012, 24, 2099-2110
Date:
2012-04-28

Author Information

Name Institution
Taeyong EomSeoul National University
Seol ChoiSeoul National University
Byung Joon ChoiSeoul National University
Min Hwan LeeUniversity of California - Merced
Taehong GwonSeoul National University
Sang Ho RhaSeoul National University
Woongkyu LeeSeoul National University
Moo-Sung KimAir Products
Manchao XiaoAir Products
Iain BuchananAir Products
Deok-Yong ChoRWTH Aachen University
Cheol Seong HwangSeoul National University

Films

Plasma TiO2


Plasma TiN


Film/Plasma Properties

Substrates

Si(100)
SiO2
TiN
TiO2

Notes

638