Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
Type:
Journal
Info:
Applied Surface Science 387 (2016) 497 - 502
Date:
2016-06-21
Author Information
Name | Institution |
---|---|
Kensaku Kanomata | Yamagata University |
K. Tokoro | Yamagata University |
Takahiro Imai | Yamagata University |
P. Pungboon Pansila | Yamagata University |
Masanori Miura | Yamagata University |
Bashir Ahmmad | Yamagata University |
Shigeru Kubota | Yamagata University |
Kazuhiro Hirahara | Yamagata University |
Fumihiko Hirose | Yamagata University |
Films
Film/Plasma Properties
Characteristic: Deposition Kinetics, Reaction Mechanism
Analysis: IRAS, Infrared Reflection Absorption Spectroscopy
Substrates
Notes
965 |