Publication Information

Title: Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2

Type: Journal

Info: J. Phys. Chem. C, 2016, 120 (11), pp 5958-5967

Date: 2016-03-11

DOI: http://dx.doi.org/10.1021/acs.jpcc.5b05286

Author Information

Name

Institution

Yonsei University

Yonsei University

Yonsei University

Yonsei University

University of Ulsan

Air Liquide

Air Liquide

Yonsei University

Incheon National University

Films

Plasma HfO2 using Unknown

Deposition Temperature Range N/A

13499-05-3

7782-44-7

Plasma HfO2 using Unknown

Deposition Temperature Range N/A

78205-93-3

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

Unknown

Unknown

Breakdown Voltage

I-V, Current-Voltage Measurements

Unknown

Leakage Current

I-V, Current-Voltage Measurements

Unknown

Substrates

Keywords

Notes

808

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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