Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors

Type:
Conference Proceedings
Info:
2016 Joint IEEE International Symposium on the Applications of Ferroelectrics, European Conference on Application of Polar Dielectrics, and Piezoelectric Force Microscopy Workshop (ISAF/ECAPD/PFM)
Date:
2016-08-21

Author Information

Name Institution
Xin LiuXi'an Jiaotong University
Yuqiu LeiXi'an Jiaotong University
Yonghong ChengXi'an Jiaotong University

Films

Plasma HfO2


Film/Plasma Properties

Characteristic: Midgap Voltage
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Interface Trap Density
Analysis: C-V, Capacitance-Voltage Measurements

Substrates

Silicon

Notes

973