Publication Information

Title: Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition

Type: Conference Proceedings

Info: 2016 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS)

Date: 2016-01-25

DOI: http://dx.doi.org/10.1109/ULIS.2016.7440045

Author Information

Name

Institution

University of Notre Dame

University of Notre Dame

University of Notre Dame

University of Notre Dame

Films

Deposition Temperature Range N/A

27804-64-4

7727-37-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

SiO2

Ni

Keywords

Single Electron Transistor (SET)

Notes

816

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2017 plasma-ald.com