Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition

Type:
Conference Proceedings
Info:
2016 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS)
Date:
2016-01-25

Author Information

Name Institution
Golnaz KarbasianUniversity of Notre Dame
Alexei P. OrlovUniversity of Notre Dame
A. S. MukasyanUniversity of Notre Dame
Gregory L. SniderUniversity of Notre Dame

Films


Film/Plasma Properties

Substrates

SiO2
Ni

Notes

816