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Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
Type:
Journal
Info:
J. Phys. Chem. Lett. 2015, 6, 3610-3614
Date:
2015-08-30
Author Information
| Name | Institution |
|---|---|
| Chaitanya Krishna Ande | Eindhoven University of Technology |
| Harm C. M. Knoops | Eindhoven University of Technology |
| Koen de Peuter | Eindhoven University of Technology |
| Maarten van Drunen | Eindhoven University of Technology |
| Simon D. Elliott | Tyndall National Institute, University College Cork |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Plasma SiNx
Plasma SiNx
Plasma SiNx
Plasma SiNx
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Substrates
| Silicon |
Notes
| 523 |