Compatibility of AlN/SiNx Passivation Technique with High-Temperature Process

Type:
Conference Proceedings
Info:
CS ManTech Conference, May 16th - 19th, 2016
Date:
2016-05-16

Author Information

Name Institution
Mengyuan HuaHong Kong University of Science and Technology
Yunyou LuHong Kong University of Science and Technology
Shenghou LiuHong Kong University of Science and Technology
Cheng LiuHong Kong University of Science and Technology
Kai FuChinese Academy of Sciences
Yong CaiChinese Academy of Sciences
Baoshun ZhangChinese Academy of Sciences
Kevin J. ChenHong Kong University of Science and Technology

Films

Plasma AlN


Film/Plasma Properties

Substrates

GaN

Notes

923