Publication Information

Title: Surface Etching of TiO2 Thin Films Using High Density Cl2/Ar Plasma

Type: Journal

Info: TRANSACTIONS ON ELECTRICAL AND ELECTRONIC MATERIALS Vol. 16, No. 6, pp. 346-350, December 25, 2015

Date: 2015-11-11

DOI: http://dx.doi.org/10.4313/TEEM.2015.16.6.346

Author Information

Name

Institution

Chung-Ang University

Chung-Ang University

Chung-Ang University

Films

Plasma TiO2 using Unknown

Deposition Temperature = 200C

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Si(100)

Keywords

Plasma etch of PEALD films

Notes

448

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