Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor

Type:
Journal
Info:
Applied Surface Science Volume 308, 30 July 2014, Pages 328-332
Date:
2014-04-24

Author Information

Name Institution
Kensaku KanomataYamagata University

Films

Plasma TiO2


Film/Plasma Properties

Characteristic: Surface Reactions
Analysis: IRAS, Infrared Reflection Absorption Spectroscopy

Characteristic: Thickness
Analysis: Ellipsometry

Substrates

Notes

Low temperature TiO2 PEALD with TDMAT and H2O plasma.
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