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Publication Information

Title: Passivation of Al2O3/TiO2 on monocrystalline Si with relatively low reflectance

Type: Journal

Info: 2016 J. Phys. D: Appl. Phys. 49 245105

Date: 2016-04-15

DOI: https://doi.org/10.1088/0022-3727/49/24/245105

Author Information

Name

Institution

National Taiwan University

National Taiwan University

National Taiwan University

Films

Plasma Al2O3 using Unknown

Deposition Temperature Range N/A

Plasma TiO2 using Unknown

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Photoluminescence

PL, PhotoLuminescence

Unknown

Substrates

Silicon

Keywords

Passivation

Notes

825

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