Publication Information

Title: Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics

Type: Journal

Info: RSC Adv., 2016, 6, 16301-16307

Date: 2016-01-20

DOI: http://dx.doi.org/10.1039/C5RA26860E

Author Information

Name

Institution

University of Alberta

University of Alberta

Films

Deposition Temperature Range N/A

19962-11-9

7782-44-7

Deposition Temperature Range N/A

19962-11-9

7732-18-5

Deposition Temperature Range N/A

19756-04-8

7782-44-7

Deposition Temperature Range N/A

19756-04-8

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Capacitance

C-V, Capacitance-Voltage Measurements

Unknown

Interface Trap Density

C-V, Capacitance-Voltage Measurements

Unknown

Leakage Current

I-V, Current-Voltage Measurements

Unknown

Substrates

Keywords

Notes

799

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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