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High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
Type:
Conference Proceedings
Info:
228th ECS Meeting, October 11-15, 2015
Date:
2015-10-11
Author Information
| Name | Institution |
|---|---|
| Jihwan An | Stanford University |
| Fritz B. Prinz | Stanford University |
Films
Other BaTiO3
Film/Plasma Properties
Characteristic: Dielectric Constant, Permittivity
Analysis: -
Characteristic: Leakage Current
Analysis: -
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: -
Characteristic: Density
Analysis: -
Substrates
Notes
| 485 |