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Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
Type:
Journal
Info:
Acta Materialia 117 (2016) 153 - 159
Date:
2016-07-06
Author Information
| Name | Institution |
|---|---|
| Yongmin Kim | Stanford University |
| Peter Schindler | Stanford University |
| Anup L. Dadlani | Stanford University |
| Shinjita Acharya | Stanford University |
| J Provine | Stanford University |
| Jihwan An | Stanford University |
| Fritz B. Prinz | Stanford University |
Films
Plasma ZrTiN
Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: -
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: -
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
Notes
| 961 |