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Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
Type:
Journal
Info:
Nanotechnology 26 024003
Date:
2014-10-17
Author Information
| Name | Institution |
|---|---|
| Stephan Ratzsch | Friedrich-Schiller-Universität Jena |
Films
Plasma TiO2
Hardware used: Oxford Instruments OpAL
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Unknown
Analysis: Raman Spectroscopy
Substrates
| Silicon |
| SiO2 |
Notes
| Oxford Instruments OpAL study of TiO2 morphology as a function of O2 plasma properties. |
| 263 |