Publication Information

Title: Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition

Type: Journal

Info: physica status solidi (a) Volume 210, Issue 2, pages 276--284, 2013

Date: 2012-10-05

DOI: http://dx.doi.org/10.1002/pssa.201228671

Author Information

Name

Institution

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Films

Plasma TiO2 using Custom ICP

Deposition Temperature Range = 50-350C

546-68-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Microstructure

TEM, Transmission Electron Microscope

Unknown

Microstructure

XRD, X-Ray Diffraction

Unknown

Bonding States

XPS, X-ray Photoelectron Spectroscopy

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Electron Diffraction

Unknown

Substrates

Si(100)

Keywords

Notes

639

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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