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Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
Type:
Journal
Info:
physica status solidi (a) Volume 210, Issue 2, pages 276--284, 2013
Date:
2012-10-05
Author Information
| Name | Institution |
|---|---|
| Jaesang Lee | Hanyang University |
| Seung Jae Lee | Hanyang University |
| Won Bae Han | Hanyang University |
| Heeyoung Jeon | Hanyang University |
| Jingyu Park | Hanyang University |
| Woochool Jang | Hanyang University |
| Chong Seung Yoon | Hanyang University |
| Hyeongtag Jeon | Hanyang University |
Films
Plasma TiO2
Film/Plasma Properties
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Microstructure
Analysis: XRD, X-Ray Diffraction
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Substrates
| Si(100) |
Notes
| 639 |