Publication Information

Title: Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4

Type: Journal

Info: J. Phys. Chem. C, 2009, 113 (37), pp 16307-16310

Date: 2009-08-12

DOI: http://dx.doi.org/10.1021/jp907266c

Author Information

Name

Institution

Colorado School of Mines

Colorado School of Mines

Colorado School of Mines

Films

Plasma TiO2 using Custom ICP

Deposition Temperature Range = 110-200C

7550-45-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-44

Refractive Index

Ellipsometry

J.A. Woollam M-44

Surface Reactions

QMS, Quadrupole Mass Spectrometer

Stanford Research Systems RGA-300

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Siemens Kristalloflex 810

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

FTIR, Fourier Transform InfraRed spectroscopy

Nicolet Nexus 870

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Digital Instruments Nanoscope III

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Kratos Axis

Substrates

Silicon

Keywords

Notes

752

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2017 plasma-ald.com