Sign up for news and updates!

Publication Information

Title: Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications

Type: Journal

Info: Applied Physics Letters 89, 093115 (2006)

Date: 2006-07-03

DOI: http://dx.doi.org/10.1063/1.2338793

Author Information

Name

Institution

Seoul National University

Seoul National University

Seoul National University

Seoul National University

Films

Plasma Ru using ASM Genitech PEALD

Deposition Temperature = 300C

32992-96-4

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Images

TEM, Transmission Electron Microscope

JEOL JEM-3000F

Images

SEM, Scanning Electron Microscopy

JEOL JSM-7400F

Resistivity, Sheet Resistance

Unknown

Unknown

Unknown

C-V, Capacitance-Voltage Measurements

Agilent 4284A LCR Meter

Substrates

SiO2

Keywords

Nucleation

Notes

1005

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2018 plasma-ald.com