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Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
Type:
Journal
Info:
Solar Energy Materials and Solar Cells, Volume 173, 2017, Pages 111 - 119
Date:
2017-05-17
Author Information
| Name | Institution |
|---|---|
| Bart Macco | Eindhoven University of Technology |
| Harm C. M. Knoops | Eindhoven University of Technology |
| Marcel A. Verheijen | Eindhoven University of Technology |
| W. Beyer | Forschungszentrum Jülich |
| Mariadriana Creatore | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Thermal ZnO
Other H:ZnO
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Measurements
Characteristic: Carrier Concentration
Analysis: Hall Measurements
Characteristic: Mobility
Analysis: Hall Measurements
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Characteristic: Thermal Effusion
Analysis: QMS, Quadrupole Mass Spectrometer
Substrates
| ZnO |
Notes
| Supplement contains ZnO etch data and nice table of experimental results https://ars.els-cdn.com/content/image/1-s2.0-S0927024817302593-mmc1.pdf |
| 1047 |