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Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
Type:
Conference Proceedings
Info:
ECS Trans. 2014 volume 64, issue 9, 15-21
Date:
2014-10-06
Author Information
| Name | Institution |
|---|---|
| Gu Young Cho | Seoul National University |
Films
Plasma Y2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
| Si(100) |
Notes
| PEALD development of Y2O3 film. |
| 288 |