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Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
Type:
Journal
Info:
Japanese Journal of Applied Physics 46, L173 (2007)
Date:
2006-12-06
Author Information
| Name | Institution |
|---|---|
| Keunjun Kim | Hanyang University |
| Keunwoo Lee | Hanyang University |
| Sejin Han | Hanyang University |
| Taeyong Park | Hanyang University |
| Youngjin Lee | Hynix Semiconductor |
| Jeongtae Kim | Hynix Semiconductor |
| Seungjin Yeom | Hynix Semiconductor |
| Hyeongtag Jeon | Hanyang University |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
Notes
| 1012 |