Publication Information

Title: Radical Enhanced Atomic Layer Deposition of Metals and Oxides

Type: Thesis

Info: Niskanen Thesis

Date: 2006-11-10

DOI: http://ethesis.helsinki.fi/julkaisut/mat/kemia/vk/niskanen/radicale.pdf

Author Information

Name

Institution

University of Helsinki

Films

Deposition Temperature Range N/A

7550-45-0

7727-37-9

Deposition Temperature Range N/A

7550-45-0

7727-37-9

1333-74-0

Deposition Temperature Range N/A

75-24-1

1333-74-0

Deposition Temperature Range N/A

555-75-9

1333-74-0

Deposition Temperature Range N/A

7446-70-0

1333-74-0

Deposition Temperature Range N/A

75-24-1

7727-37-9

Deposition Temperature Range N/A

1287-13-4

1333-74-0

Deposition Temperature Range N/A

7721-01-9

1333-74-0

Deposition Temperature Range N/A

3236-82-6

1333-74-0

Deposition Temperature Range N/A

13499-05-3

1333-74-0

Deposition Temperature Range N/A

21679-31-2

1333-74-0

Deposition Temperature Range N/A

10241-05-1

1333-74-0

Deposition Temperature Range N/A

0-0-0

1333-74-0

Deposition Temperature Range N/A

14040-05-2

7782-44-7

Deposition Temperature Range N/A

13395-16-9

7782-44-7

Deposition Temperature Range N/A

0-0-0

546-68-9

7782-44-7

Deposition Temperature Range N/A

78-10-4

7782-44-7

Deposition Temperature Range N/A

544-97-8

7782-44-7

Deposition Temperature Range N/A

3236-82-6

7782-44-7

Deposition Temperature Range N/A

21679-31-2

7782-44-7

Deposition Temperature Range N/A

1287-13-4

7782-44-7

Deposition Temperature Range N/A

0-0-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

Thesis covers 5 materials: Al2O3, Ta2O5, TiO2, Cu, and Ag. Films listed on this page either did not work at the chosen experimental conditions or the resulting films were less studied. Consult tables 6 and 10 in the thesis for further information.

87

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