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Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
Type:
Journal
Info:
Surface & Coatings Technology 228, Supplement 1 (2013) S55 - S60
Date:
2012-08-27
Author Information
| Name | Institution |
|---|---|
| Xingcun Li | Beijing Institute of Graphic Communication |
| Wenwen Lei | Beijing Institute of Graphic Communication |
| Qiao Zhao | Beijing Institute of Graphic Communication |
| Qiang Chen | Beijing Institute of Graphic Communication |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Optical Properties
Analysis: Ellipsometry
Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Substrates
| Si(100) |
Notes
| 653 |