Publication Information

Title: Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS

Type: Journal

Info: Materials 2015, 8, 5425

Date: 2015-11-12

DOI: http://dx.doi.org/10.3390/ma8115425

Author Information

Name

Institution

Friedrich-Schiller-Universität Jena

Friedrich-Schiller-Universität Jena

Friedrich-Schiller-Universität Jena

Friedrich-Schiller-Universität Jena

Films

Deposition Temperature = 100C

546-68-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000

Refractive Index

Ellipsometry

J.A. Woollam M-2000

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

Hitachi S-4800 Field Emission Scanning Electron Microscope

Substrates

Keywords

Substrate Biasing

Notes

413

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