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Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 13 2 G13-G16 2010
Date:
2009-12-09
Author Information
| Name | Institution |
|---|---|
| Seok-Jun Won | Seoul National University |
| Sungin Suh | Seoul National University |
| Sang Woon Lee | Seoul National University |
| Gyu-Jin Choi | Seoul National University |
| Cheol Seong Hwang | Seoul National University |
| Hyeong Joon Kim | Seoul National University |
Films
Plasma TiO2
Film/Plasma Properties
Characteristic: Areal Density
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Substrates
| Ru |
| Pt |
| Al2O3 |
| Silicon |
Notes
| 31 |