Publication Information

Title: Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas

Type: Journal

Info: Electrochemical and Solid-State Letters, 13 2 G13-G16 2010

Date: 2009-12-09

DOI: http://dx.doi.org/10.1149/1.3269901

Author Information

Name

Institution

Seoul National University

Seoul National University

Seoul National University

Seoul National University

Seoul National University

Seoul National University

Films

Deposition Temperature = 280C

546-68-9

10024-97-2

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Areal Density

EDS, EDX, Energy Dispersive X-ray Spectroscopy

Unknown

Thickness

Ellipsometry

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

Unknown

Substrates

Ru

Pt

Al2O3

Silicon

Keywords

Atomic Layer Deposition

Atom-surface Impact

Diffusion

Insulating Thin Films

Plasma Deposition

Semiconductor Growth

Semiconductor Materials

Semiconductor Thin Films

Titanium Compounds

Notes

31

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2017 plasma-ald.com