Publication Information

Title: Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures

Type: Journal

Info: Phys. Status Solidi C 12, No.4-5, 394-398 (2015)

Date: 2015-01-20

DOI: http://dx.doi.org/10.1002/pssc.201400167

Author Information

Name

Institution

Bilkent University

Bilkent University

Bilkent University

Bilkent University

Bilkent University

Bilkent University

Bilkent University

Bilkent University

Films

Deposition Temperature = 200C

75-24-1

7664-41-7

Deposition Temperature = 200C

75-24-1

7727-37-9

1333-74-0

Deposition Temperature = 200C

1445-79-0

7664-41-7

Deposition Temperature = 200C

1445-79-0

7727-37-9

1333-74-0

Deposition Temperature = 200C

75-24-1

1445-79-0

7664-41-7

Deposition Temperature = 200C

75-24-1

1445-79-0

7727-37-9

1333-74-0

Deposition Temperature = 200C

3385-78-2

7664-41-7

Deposition Temperature = 200C

3385-78-2

7727-37-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Refractive Index

Ellipsometry

J.A. Woollam VASE

Extinction Coefficient

Ellipsometry

J.A. Woollam VASE

Thickness

Ellipsometry

J.A. Woollam VASE

Optical Properties

Optical Transmission

Cary Varian 100 UV-Vis Spectrometer

Photoluminescence

PL, PhotoLuminescence

Jobin Yvon FL-1057 TCSPC

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Bonding States

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Density

XRR, X-Ray Reflectivity

PANalytical Xpert PRO MRD X-ray Diffractometer

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Images

TEM, Transmission Electron Microscope

FEI Tecnai G2 F30

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Electron Diffraction

FEI Tecnai G2 F30

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Park Systems, XE-100

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

FEI Quanta 200 FEG

Chemical Composition, Impurities

SIMS, Secondary Ion Mass Spectrometry

Unknown

Substrates

Nylon 6,6

Silicon

Keywords

Notes

Summary of other recent publications.

321

Disclaimer

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