Publication Information

Title: Al2O3/TiO2 nanolaminate gate dielectric films with enhanced electrical performances for organic field-effect transistors

Type: Journal

Info: Organic Electronics, Volume 28, 2016, Pages 139 - 146

Date: 2015-10-23

DOI: http://dx.doi.org/10.1016/j.orgel.2015.10.025

Author Information

Name

Institution

Pohang University of Science and Technology (POSTECH)

Sungkyunkwan University

Pohang University of Science and Technology (POSTECH)

Pohang University of Science and Technology (POSTECH)

Yeungnam University

Yeungnam University

Yeungnam University

Pohang University of Science and Technology (POSTECH)

Films

Plasma Al2O3 using Unknown

Deposition Temperature Range N/A

Plasma TiO2 using Unknown

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

417

Disclaimer

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