Room-Temperature Atomic Layer Deposition of Platinum

Type:
Journal
Info:
Chem. Mater., 2013, 25 (9), pp 1769-1774
Date:
2013-03-18

Author Information

Name Institution
Adriaan J. M. MackusEindhoven University of Technology
Diana Garcia-AlonsoEindhoven University of Technology
Harm C. M. KnoopsEindhoven University of Technology
Ageeth A. BolEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films



Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Deposition Kinetics, Reaction Mechanism
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Unknown
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

PEN, Polyethylene Napthalate
PET, Polyethylene Terephthalate
Paper
Cotton
SiO2
Al2O3

Notes

114