Title: Chemical reactions during plasma-enhanced atomic layer deposition of SiO2 films employing aminosilane and O2/Ar plasma at 50°C
Info: Japanese Journal of Applied Physics 53, 010305 (2014)
ASM Microchemistry Oy
Deposition Kinetics, Reaction Mechanism
Precursor identified as aminosilane in abstract but that is more of a class of precursors than a specific molecule.
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