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Publication Information

Title: Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)

Type: Journal

Info: Proc. SPIE 7520, Lithography Asia 2009

Date: 2009-12-09

DOI: http://dx.doi.org/10.1117/12.836979

Author Information

Name

Institution

ASM Microchemistry Oy

IMEC

IMEC

IMEC

IMEC

ASM Microchemistry Oy

IMEC

ASM Microchemistry Oy

IMEC

ASM Microchemistry Oy

ASM Microchemistry Oy

IMEC

Films

Plasma SiO2 using Unknown

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Images

SEM, Scanning Electron Microscopy

Unknown

Substrates

Photoresist

Keywords

Double Patterning

Notes

747

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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