Comparative study of ALD SiO2 thin films for optical applications

Type:
Journal
Info:
Optical Materials Express, v. 6, n. 2, p. 660--670 (2016)
Date:
2016-01-18

Author Information

Name Institution
Kristin PfeifferFriedrich-Schiller-Universität Jena
Svetlana ShestaevaFraunhofer Institute for Applied Optics and Precision Engineering
Astrid BingelFriedrich-Schiller-Universität Jena
Peter MunzertFraunhofer Institute for Applied Optics and Precision Engineering
Lilit GhazaryanFriedrich-Schiller-Universität Jena
Cristian Van HelvoirtEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Umut T. SanliMax Planck Institute for Intelligent Systems
Corinne GréventMax Planck Institute for Intelligent Systems
Gisela SchützMax Planck Institute for Intelligent Systems
Matti PutkonenVTT Technical Research Centre
Iain BuchananAir Products
Lars JensenLaser Zentrum Hannover e.V.
Detlev RistauLaser Zentrum Hannover e.V.
Andreas TünnermannFriedrich-Schiller-Universität Jena
Adriana SzeghalmiFriedrich-Schiller-Universität Jena

Films

Plasma SiO2


Plasma SiO2


Plasma SiO2


Thermal SiO2

Hardware used: Picosun R200

CAS#: 0-0-0

CAS#: 10028-15-6

Film/Plasma Properties

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Optical Properties
Analysis: Optical Transmission

Characteristic: Optical Properties
Analysis: Optical Reflectivity

Characteristic: Optical Properties
Analysis: Laser Calorimetry

Substrates

Si(100)
Ta2O5
Lithosil Q1
Glass, BK7
Glass, B270

Notes

762