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Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 35, 01B141 (2017)
Date:
2016-12-08
Author Information
| Name | Institution |
|---|---|
| Adam Bertuch | Cambridge NanoTech |
| Brent D. Keller | MIT |
| Nicola Ferralis | MIT |
| Jeffrey C. Grossman | MIT |
| Ganesh M. Sundaram | Cambridge NanoTech |
Films
Plasma MoCN
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Critical Temperature
Analysis: Critical Temperature Measurement
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| Si with native oxide |
| SiO2 |
Notes
| 890 |