Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 050605 (2016)
Date:
2016-08-17

Author Information

Name Institution
Triratna MuneshwarUniversity of Alberta
Gem ShouteUniversity of Alberta
Douglas W. BarlageUniversity of Alberta
Kenneth C. CadienUniversity of Alberta

Films

Plasma ZnO


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Resistivity, Sheet Resistance
Analysis: van der Pauw sheet resistance

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

Si(100)

Notes

896