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Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
Type:
Journal
Info:
J. Vac. Sci. Technol. A 32(1), Jan/Feb 2014, 01A120
Date:
2013-11-26
Author Information
| Name | Institution |
|---|---|
| John Pointet | CEA - LETI MINATEC |
| Patrice Gonon | CEA - LETI MINATEC |
| Lawrence Latu-Romain | CEA - LETI MINATEC |
| Ahmad Bsiesy | CEA - LETI MINATEC |
| Christophe Vallée | CEA - LETI MINATEC |
Films
Plasma TiO2
Plasma AlTixOy
Film/Plasma Properties
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: EOT, Equivalent Oxide Thickness
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Substrates
| Pt |
| SiO2 |
Notes
| 8 |