Publication Information

Title: Bipolar resistive switching in amorphous titanium oxide thin film

Type: Journal

Info: physica status solidi (RRL) - Rapid Research Letters Volume 4, Issue 1-2, pages 28--30, 2010

Date: 2009-11-23

DOI: http://dx.doi.org/10.1002/pssr.200903383

Author Information

Name

Institution

Korea Advanced Institute of Science and Technology

Korea Advanced Institute of Science and Technology

Electronics and Telecommunication Research Institute, (ETRI)

Electronics and Telecommunication Research Institute, (ETRI)

Films

Plasma TiO2 using Unknown

Deposition Temperature = 180C

546-68-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Resistive Switching

I-V, Current-Voltage Measurements

Keithley 4200-SCS

Images

TEM, Transmission Electron Microscope

JEOL 3010

Substrates

Al

Keywords

Resistive Switch

Notes

Available on archive.org at https://arxiv.org/pdf/0908.3525.pdf

738

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2017 plasma-ald.com