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Publication Information

Title: An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon

Type: Journal

Info: Microelectronic Engineering 162 (2016) 40 - 44

Date: 2016-05-08

DOI: http://dx.doi.org/10.1016/j.mee.2016.05.001

Author Information

Name

Institution

CNRS - LPN

CNRS - LPN

CNRS - LPN

CNRS - LPN

GeePs Group of electrical engineering - Paris

CNRS - Univ de Poitiers

Films

Plasma SiO2 using Unknown

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Substrates

Silicon

Keywords

Notes

828

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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